KrF, XeCl, XeF Lasers (248 nm, 308 nm, 351 nm)
Turning Mirrors
| Coating | R (AOI = 0°) | Rs (AOI = 45°) | Rp (AOI = 45°) |
|---|---|---|---|
| 248 nm IAD | > 99.0 % | > 99.5 % | > 99.0 % |
| 248 nm sputtering | > 99.7 % | > 99.8 % | > 99.6 % |
| 308 nm IAD | > 99.7 % | > 99.8 % | > 99.5 % |
| 308 nm sputtering | > 99.9 % | > 99.9 % | > 99.7 % |
| 351 nm IAD | > 99.9 % | > 99.9 % | > 99.7 % |
| 351 nm sputtering | > 99.95 % | > 99.95 % | > 99.9 % |
LIDT and Lifetime Data
| Coating | LIDT* [J/cm²] |
|---|---|
| HR (0°, 248 nm) IAD | 10 J/cm² (1-on-1) 5 J/cm² (1000-on-1) |
| HR (45°, 248 nm) IAD | 10 J/cm² (1-on-1) |
| * Measurements were performed at Laser Labor Göttingen and at Friedrich-Schiller-University Jena | |
| Coating | Lifetime |
|---|---|
| HR (0°, 248 nm) | 2 × 108 pulses* |
| PR (0°, 248 nm) = 50 % | 2 × 108 pulses* |
| AR (0°, 248 nm) | 2 × 108 pulses** |
| HR (0°, 308 nm) | 2 × 108 pulses** |
| HR (0°, 351 nm) | 2 × 108 pulses** |
| PR (0°, 351 nm) = 25 % | 2 × 108 pulses** |
| * Energy density: 100 mJ/cm², repetition rate: 100 Hz, pulse duration: 15 ns; tested at COHERENT AG, München | |
| ** Energy density: 55 mJ/cm², repetition rate: 100 Hz, pulse duration: 15 ns; tested at COHERENT AG, München | |
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