KrF, XeCl, XeF Lasers (248 nm, 308 nm, 351 nm)
Turning Mirrors
Coating | R (AOI = 0°) | Rs (AOI = 45°) | Rp (AOI = 45°) |
---|---|---|---|
248 nm IAD | > 99.0 % | > 99.5 % | > 99.0 % |
248 nm sputtering | > 99.7 % | > 99.8 % | > 99.6 % |
308 nm IAD | > 99.7 % | > 99.8 % | > 99.5 % |
308 nm sputtering | > 99.9 % | > 99.9 % | > 99.7 % |
351 nm IAD | > 99.9 % | > 99.9 % | > 99.7 % |
351 nm sputtering | > 99.95 % | > 99.95 % | > 99.9 % |
LIDT and Lifetime Data
Coating | LIDT* [J/cm²] |
---|---|
HR (0°, 248 nm) IAD | 10 J/cm² (1-on-1) 5 J/cm² (1000-on-1) |
HR (45°, 248 nm) IAD | 10 J/cm² (1-on-1) |
* Measurements were performed at Laser Labor Göttingen and at Friedrich-Schiller-University Jena |
Coating | Lifetime |
---|---|
HR (0°, 248 nm) | 2 × 108 pulses* |
PR (0°, 248 nm) = 50 % | 2 × 108 pulses* |
AR (0°, 248 nm) | 2 × 108 pulses** |
HR (0°, 308 nm) | 2 × 108 pulses** |
HR (0°, 351 nm) | 2 × 108 pulses** |
PR (0°, 351 nm) = 25 % | 2 × 108 pulses** |
* Energy density: 100 mJ/cm², repetition rate: 100 Hz, pulse duration: 15 ns; tested at COHERENT AG, München | |
** Energy density: 55 mJ/cm², repetition rate: 100 Hz, pulse duration: 15 ns; tested at COHERENT AG, München |
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