CarboNex – We’re going shorter. Much shorter.

Mellingen, August 19, 2026

While the rest of the world debates the next big thing, we’re busy shrinking wavelengths down to 6.X nm — because apparently "extreme ultraviolet" wasn’t extreme enough. Say hello to BEUV: Beyond Extreme Ultraviolet Lithography.

In our new collaborative project CarboNex, we’re teaming up with optiX fab GmbH and Fraunhofer IOF to develop a high-performance, environmentally friendly optics technology that could power the next generation of chip manufacturing.

Our job? Making optical substrates so smooth, that light barely notices it’s there. We’re talking about an rms surface roughness below 0.15 nm.

The European Regional Development Fund backs regional innovations like this.